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Volumn 5375, Issue PART 1, 2004, Pages 437-443

OPC accuracy and process window verification methodology for sub-100nm node

Author keywords

Cad data; Core and peripherals; NMQ; OPC verification; Optical lithography; PWQ; RET

Indexed keywords

CAD DATA; CORE AND PERIPHERALS; NEW MASK QUALIFICATION (NQM); OPC VERIFICATION; PROCESS WINDOW QUALIFICATION (PWQ);

EID: 4344579745     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.535121     Document Type: Conference Paper
Times cited : (12)

References (5)
  • 1
    • 0141610152 scopus 로고    scopus 로고
    • Model-based PPC verification methodology with two-dimensional pattern feature extraction
    • Kohji Hashimoto et al., Model-based PPC verification methodology with two-dimensional pattern feature extraction, Proc. of SPIE vol. 5040, 2003.
    • (2003) Proc. of SPIE , vol.5040
    • Hashimoto, K.1
  • 2
    • 0141723651 scopus 로고    scopus 로고
    • New method for the quantitative evaluation of wafer pattern shape based on CAD data
    • Ryoichi Matsuoka et al., New method for the quantitative evaluation of wafer pattern shape based on CAD data, Proc. of SPIE vol. 5038, 2003.
    • (2003) Proc. of SPIE , vol.5038
    • Matsuoka, R.1
  • 3
    • 0036030171 scopus 로고    scopus 로고
    • Quantification of OPC performance of 150-nm gates using top-down CD-SEM
    • Ashesh Parikh et al., Quantification of OPC performance of 150-nm gates using top-down CD-SEM, Proc. of SPIE vol. 4689, 2002.
    • (2002) Proc. of SPIE , vol.4689
    • Parikh, A.1
  • 4
    • 1842474913 scopus 로고    scopus 로고
    • Multichip reticle approach for OPC model verification
    • Kunal N. Taravade et al., Multichip reticle approach for OPC model verification, Proc. of SPIE vol. 5256, 2003.
    • (2003) Proc. of SPIE , vol.5256
    • Taravade, K.N.1
  • 5
    • 1642555637 scopus 로고    scopus 로고
    • Identifying process window marginalities of reticle designs for 0.15/0.13-um technologies
    • Shih Chieh Lo at al., Identifying process window marginalities of reticle designs for 0.15/0.13-um technologies, Proc. of SPIE vol. 5130, 2003
    • (2003) Proc. of SPIE , vol.5130
    • Lo, S.C.1    Al, A.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.