|
Volumn 5375, Issue PART 1, 2004, Pages 437-443
|
OPC accuracy and process window verification methodology for sub-100nm node
|
Author keywords
Cad data; Core and peripherals; NMQ; OPC verification; Optical lithography; PWQ; RET
|
Indexed keywords
CAD DATA;
CORE AND PERIPHERALS;
NEW MASK QUALIFICATION (NQM);
OPC VERIFICATION;
PROCESS WINDOW QUALIFICATION (PWQ);
COMPUTER AIDED DESIGN;
DIFFRACTION;
DYNAMIC RANDOM ACCESS STORAGE;
OPTICAL RESOLVING POWER;
SCANNING ELECTRON MICROSCOPY;
SILICON WAFERS;
PHOTOLITHOGRAPHY;
|
EID: 4344579745
PISSN: 0277786X
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1117/12.535121 Document Type: Conference Paper |
Times cited : (12)
|
References (5)
|