Multi-Chip Reticle Approach for OPC Model Verification

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5256, Issue 2, 2003, Pages 945-955

  Taravade, Kunal N ^a,c   Belova, Nadya ^a   Jost, Andrew M ^b   Callan, Neal P ^a  

^a AGERE SYSTEMS   (United States)

^b UNIVERSITY OF OREGON   (United States)

^c NONE   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPACT DISKS; ETCHING; IMAGE ANALYSIS; LOGIC DESIGN; MEASUREMENTS; PHOTOLITHOGRAPHY; ROBUSTNESS (CONTROL SYSTEMS); SEMICONDUCTOR DEVICES; SILICON WAFERS; STATIC RANDOM ACCESS STORAGE;

OPTICAL PROXIMITY CORRECTION (OPC);

MICROPROCESSOR CHIPS;

EID: 1842474913     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.518217     Document Type: Conference Paper

References (1)

1. Calibre User's Manual, ver.2002.08, Mentor Graphics Corp. 2002.