Quantification of opc performance of 150 nm gates using top-down cd sem

Proceedings of SPIE-The International Society for Optical Engineering

Volumn 4689 I, Issue , 2002, Pages 500-505

  Parikh, Ashesh ^a   Zhou, Haiqing ^a   Wang, Chih Yu ^b   Macnaughton, Craig ^c  

^a TEXAS INSTRUMENTS   (United States)

^b KLA Tencor Austin   (United States)

^c KLA TENCOR CORPORATION   (United States)

Author keywords

Cd sem; Mask; Opc; Pattern integrity; Siam

Indexed keywords

ETCHING; IMAGE PROCESSING; SCANNING ELECTRON MICROSCOPY; SILICON; SURFACE ROUGHNESS;

PATTERN INTEGRITY;

MASKS;

EID: 0036030171     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.473489     Document Type: Article

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