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Volumn 15, Issue 2, 2007, Pages 113-118

PECVD-based nanocrystalline-silicon TFT backplanes for large-sized AMOLED displays

Author keywords

AMOLEDs; Ellipsometry; Microcrystalline silicon; PECVD; Raman; Stability; TFT

Indexed keywords

MICROCRYSTALLINE SILICON; NANOCRYSTALLINE ALLOYS; NANOCRYSTALLINE MATERIALS; NANOCRYSTALLINE SILICON; NANOSTRUCTURED MATERIALS; PLASMA DEPOSITION; PLASMA STABILITY; POLYSILICON; SILICON; THIN FILM TRANSISTORS;

EID: 43349101816     PISSN: 10710922     EISSN: None     Source Type: Journal    
DOI: 10.1889/1.2709730     Document Type: Conference Paper
Times cited : (15)

References (9)
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    • Investigation of grain boundary control in the drain junction on laser-crystallized poly-Si thin film transistors
    • T F Chen, C F Yeh, and J C Lou, "Investigation of grain boundary control in the drain junction on laser-crystallized poly-Si thin film transistors," IEEE Electron Device Lett 24, No. 7, 457-459 (2003).
    • (2003) IEEE Electron Device Lett , vol.24 , Issue.7 , pp. 457-459
    • Chen, T.F.1    Yeh, C.F.2    Lou, J.C.3
  • 4
    • 0142198864 scopus 로고    scopus 로고
    • Nanocrystalline silicon thin film transistors, Circuits, Devices and Systems
    • I C Cheng and S Wagner, "Nanocrystalline silicon thin film transistors," Circuits, Devices and Systems, IEEE Proc 150, No. 4, 339-344 (2003).
    • (2003) IEEE Proc , vol.150 , Issue.4 , pp. 339-344
    • Cheng, I.C.1    Wagner, S.2
  • 5
    • 20844453706 scopus 로고    scopus 로고
    • High-Mobility nanocrystalline silicon thin-film transistors fabricated by plasma-enhanced chemical vapor deposition
    • C H Lee, A Sazonov, and A Nathan, "High-Mobility nanocrystalline silicon thin-film transistors fabricated by plasma-enhanced chemical vapor deposition," Appl Phys Lett 86, 222106 (2005).
    • (2005) Appl Phys Lett , vol.86 , pp. 222106
    • Lee, C.H.1    Sazonov, A.2    Nathan, A.3
  • 6
    • 0035272607 scopus 로고    scopus 로고
    • Microcrystalline silicon by plasma enhanced chemical vapor deposition from silicon tetra fluoride
    • G Cicala, P Capezzuto, and G Bruno, "Microcrystalline silicon by plasma enhanced chemical vapor deposition from silicon tetra fluoride," J Vacuum Sci and Technol, A 19, No. 2, 515-523 (2001).
    • (2001) J Vacuum Sci and Technol, A , vol.19 , Issue.2 , pp. 515-523
    • Cicala, G.1    Capezzuto, P.2    Bruno, G.3
  • 7
    • 0242581692 scopus 로고    scopus 로고
    • Microcrystalline silicon thin films grown by PECVD growth mechanisms and grain size control
    • P Roca i Cabarrocas, AFI Morral, B Kalache, and S Kasouit, "Microcrystalline silicon thin films grown by PECVD growth mechanisms and grain size control," Solid State Phenomena. 93, 257-268 (2003).
    • (2003) Solid State Phenomena , vol.93 , pp. 257-268
    • Roca i Cabarrocas, P.1    Morral, A.F.I.2    Kalache, B.3    Kasouit, S.4
  • 8
    • 0035247830 scopus 로고    scopus 로고
    • Stability of plasma deposited thin film transistors Comparison of amorphous and microcrystalline silicon
    • R B Wehrspohn, S C Deane, I D French, and M J Powell, "Stability of plasma deposited thin film transistors Comparison of amorphous and microcrystalline silicon," Thin Solid films 383, 117-121 (2001).
    • (2001) Thin Solid films , vol.383 , pp. 117-121
    • Wehrspohn, R.B.1    Deane, S.C.2    French, I.D.3    Powell, M.J.4
  • 9
    • 32244443190 scopus 로고    scopus 로고
    • A 14.1-in. WXGA solution processed OLED display with a-Si TFT
    • A Saafir, K Chung, et al, "A 14.1-in. WXGA solution processed OLED display with a-Si TFT," SID Symposium Digest Tech Papers 36, 968-971 (2005).
    • (2005) SID Symposium Digest Tech Papers , vol.36 , pp. 968-971
    • Saafir, A.1    Chung, K.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.