-
1
-
-
24744434424
-
Comparison of a-Si and poly-Si for AMOLEDs
-
J J Lih, C F Sung, C H Li, T H Hsiao, and H H Lee, "Comparison of a-Si and poly-Si for AMOLEDs," SID Symposium Digest Tech Papers 35, 1504-1507 (2004).
-
(2004)
SID Symposium Digest Tech Papers
, vol.35
, pp. 1504-1507
-
-
Lih, J.J.1
Sung, C.F.2
Li, C.H.3
Hsiao, T.H.4
Lee, H.H.5
-
2
-
-
1942521627
-
Microcrystalline silicon: An emerging material for stable thin film transistors
-
P Roca i Cabarrocas, S Kasouit, B Kalache, R Vanderhaghen, Y Bonnassieux, M Elyaakoubi, and I French, "Microcrystalline silicon: An emerging material for stable thin film transistors," J Soc Info Display 12, No. 1, 3-9 (2004).
-
(2004)
J Soc Info Display
, vol.12
, Issue.1
, pp. 3-9
-
-
Roca i Cabarrocas, P.1
Kasouit, S.2
Kalache, B.3
Vanderhaghen, R.4
Bonnassieux, Y.5
Elyaakoubi, M.6
French, I.7
-
3
-
-
0042388014
-
Investigation of grain boundary control in the drain junction on laser-crystallized poly-Si thin film transistors
-
T F Chen, C F Yeh, and J C Lou, "Investigation of grain boundary control in the drain junction on laser-crystallized poly-Si thin film transistors," IEEE Electron Device Lett 24, No. 7, 457-459 (2003).
-
(2003)
IEEE Electron Device Lett
, vol.24
, Issue.7
, pp. 457-459
-
-
Chen, T.F.1
Yeh, C.F.2
Lou, J.C.3
-
4
-
-
0142198864
-
Nanocrystalline silicon thin film transistors, Circuits, Devices and Systems
-
I C Cheng and S Wagner, "Nanocrystalline silicon thin film transistors," Circuits, Devices and Systems, IEEE Proc 150, No. 4, 339-344 (2003).
-
(2003)
IEEE Proc
, vol.150
, Issue.4
, pp. 339-344
-
-
Cheng, I.C.1
Wagner, S.2
-
5
-
-
20844453706
-
High-Mobility nanocrystalline silicon thin-film transistors fabricated by plasma-enhanced chemical vapor deposition
-
C H Lee, A Sazonov, and A Nathan, "High-Mobility nanocrystalline silicon thin-film transistors fabricated by plasma-enhanced chemical vapor deposition," Appl Phys Lett 86, 222106 (2005).
-
(2005)
Appl Phys Lett
, vol.86
, pp. 222106
-
-
Lee, C.H.1
Sazonov, A.2
Nathan, A.3
-
6
-
-
0035272607
-
Microcrystalline silicon by plasma enhanced chemical vapor deposition from silicon tetra fluoride
-
G Cicala, P Capezzuto, and G Bruno, "Microcrystalline silicon by plasma enhanced chemical vapor deposition from silicon tetra fluoride," J Vacuum Sci and Technol, A 19, No. 2, 515-523 (2001).
-
(2001)
J Vacuum Sci and Technol, A
, vol.19
, Issue.2
, pp. 515-523
-
-
Cicala, G.1
Capezzuto, P.2
Bruno, G.3
-
7
-
-
0242581692
-
Microcrystalline silicon thin films grown by PECVD growth mechanisms and grain size control
-
P Roca i Cabarrocas, AFI Morral, B Kalache, and S Kasouit, "Microcrystalline silicon thin films grown by PECVD growth mechanisms and grain size control," Solid State Phenomena. 93, 257-268 (2003).
-
(2003)
Solid State Phenomena
, vol.93
, pp. 257-268
-
-
Roca i Cabarrocas, P.1
Morral, A.F.I.2
Kalache, B.3
Kasouit, S.4
-
8
-
-
0035247830
-
Stability of plasma deposited thin film transistors Comparison of amorphous and microcrystalline silicon
-
R B Wehrspohn, S C Deane, I D French, and M J Powell, "Stability of plasma deposited thin film transistors Comparison of amorphous and microcrystalline silicon," Thin Solid films 383, 117-121 (2001).
-
(2001)
Thin Solid films
, vol.383
, pp. 117-121
-
-
Wehrspohn, R.B.1
Deane, S.C.2
French, I.D.3
Powell, M.J.4
-
9
-
-
32244443190
-
A 14.1-in. WXGA solution processed OLED display with a-Si TFT
-
A Saafir, K Chung, et al, "A 14.1-in. WXGA solution processed OLED display with a-Si TFT," SID Symposium Digest Tech Papers 36, 968-971 (2005).
-
(2005)
SID Symposium Digest Tech Papers
, vol.36
, pp. 968-971
-
-
Saafir, A.1
Chung, K.2
|