메뉴 건너뛰기




Volumn 24, Issue 7, 2003, Pages 457-459

Investigation of grain boundary control in the drain junction on laser-crystalized poly-Si thin film transistors

Author keywords

Drain junction; Electrical characteristics; Grain boundaries; Kink effect; Laser crystallized poly Si; Reliability

Indexed keywords

AMORPHOUS SILICON; CRYSTALLIZATION; ELECTRIC CURRENTS; GRAIN BOUNDARIES; HOT CARRIERS; POLYSILICON; RELIABILITY; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR DEVICE STRUCTURES; THRESHOLD VOLTAGE;

EID: 0042388014     PISSN: 07413106     EISSN: None     Source Type: Journal    
DOI: 10.1109/LED.2003.814007     Document Type: Letter
Times cited : (29)

References (13)
  • 1
    • 0001176575 scopus 로고    scopus 로고
    • High throughput CW-laser lateral crystallization for low-temperature poly-Si TFT's and fabrication of 16 bit SRAM's and 270 MHz shift registers
    • N. Sasaki, A. Hara, F. Takeuchi, Y. Mishima, T. Kakehi, K. Yoshino, and M. Takei, "High throughput CW-laser lateral crystallization for low-temperature poly-Si TFT's and fabrication of 16 bit SRAM's and 270 MHz shift registers," in SID Tech. Dig., 2002, pp. 154-157.
    • (2002) SID Tech. Dig. , pp. 154-157
    • Sasaki, N.1    Hara, A.2    Takeuchi, F.3    Mishima, Y.4    Kakehi, T.5    Yoshino, K.6    Takei, M.7
  • 3
    • 0035362504 scopus 로고    scopus 로고
    • High-performance low-temperature poly-Si TFT's crystallized by eximer laser irradiation with recessed-channel structure
    • June
    • C.-W. Lin, L.-J. Cheng, Y.-L. Lu, Y.-S. Lee, and H.-C. Cheng, "High-performance low-temperature poly-Si TFT's crystallized by eximer laser irradiation with recessed-channel structure." IEEE Electron Device Lett., vol. 22, pp. 269-271, June 2001.
    • (2001) IEEE Electron Device Lett. , vol.22 , pp. 269-271
    • Lin, C.-W.1    Cheng, L.-J.2    Lu, Y.-L.3    Lee, Y.-S.4    Cheng, H.-C.5
  • 5
    • 0001293246 scopus 로고    scopus 로고
    • Dependence of polycrystalline silicon thin-film transistor characteristics on the grain-boundary location
    • M. Kimura, S. Inoue, and T. Shimoda. "Dependence of polycrystalline silicon thin-film transistor characteristics on the grain-boundary location," J. Appl. Phys., vol. 89, pp. 596-600, 2001.
    • (2001) J. Appl. Phys. , vol.89 , pp. 596-600
    • Kimura, M.1    Inoue, S.2    Shimoda, T.3
  • 6
    • 0006941060 scopus 로고
    • Influence of deposition pressure on the output characteristics of low pressure chemical vapor deposited polycrystalline silicon thin-film transistors
    • C. A. Dimitriadis, P. A. Coxon, and N. A. Economou, "Influence of deposition pressure on the output characteristics of low pressure chemical vapor deposited polycrystalline silicon thin-film transistors," Appl. Phys. Lett., vol. 63, pp. 943-945, 1993.
    • (1993) Appl. Phys. Lett. , vol.63 , pp. 943-945
    • Dimitriadis, C.A.1    Coxon, P.A.2    Economou, N.A.3
  • 7
    • 0025576796 scopus 로고
    • Mechanism and device-to-device variation of leakage current in polysilicon thin film transistors
    • I.-W. Wu, A. G. Lewis, T-Y. Huang, W. B. Jackson, and A. Chiang, "Mechanism and device-to-device variation of leakage current in polysilicon thin film transistors," in IEDM Tech. Dig., 1990, pp. 867-870.
    • (1990) IEDM Tech. Dig. , pp. 867-870
    • Wu, I.-W.1    Lewis, A.G.2    Huang, T.-Y.3    Jackson, W.B.4    Chiang, A.5
  • 8
    • 0025575388 scopus 로고
    • Two-dimensional device simulation for avalanche induced short channel effect in poly-Si TFT
    • S. Yamada, S. Yokoyama, and M. Koyanagi, "Two-dimensional device simulation for avalanche induced short channel effect in poly-Si TFT," in IEDM Tech. Dig., 1990, pp. 859-862.
    • (1990) IEDM Tech. Dig. , pp. 859-862
    • Yamada, S.1    Yokoyama, S.2    Koyanagi, M.3
  • 9
    • 0032309646 scopus 로고    scopus 로고
    • Kink-free polycrystalline silicon double-gate elevated-channel thin-film transistors
    • Dec.
    • K. P. A. Kumar, K. O. S. Johnny, T. N. Cuong, and K. K. Ping, "Kink-free polycrystalline silicon double-gate elevated-channel thin-film transistors," IEEE Trans. Electron Devices, vol. 45, pp. 2514-2520, Dec. 1998.
    • (1998) IEEE Trans. Electron Devices , vol.45 , pp. 2514-2520
    • Kumar, K.P.A.1    Johnny, K.O.S.2    Cuong, T.N.3    Ping, K.K.4
  • 10
    • 0032625316 scopus 로고    scopus 로고
    • A new I-V model considering the impact-ionization effect initiated by the DIGBL current for the intrinsic n-channel poly-Si TFT's
    • Apr.
    • H.-L. Chen and C.-Y. Wu, "A new I-V model considering the impact-ionization effect initiated by the DIGBL current for the intrinsic n-channel poly-Si TFT's," IEEE Trans. Electron Devices, vol. 46, pp. 722-728, Apr. 1999.
    • (1999) IEEE Trans. Electron Devices , vol.46 , pp. 722-728
    • Chen, H.-L.1    Wu, C.-Y.2
  • 11
    • 0026151511 scopus 로고
    • Avalanche-induced effects in polysilicon thin-film transistors
    • May
    • M. Hack and A. G. Lewis, "Avalanche-induced effects in polysilicon thin-film transistors," IEEE Electron Device Lett., vol. 12, pp. 203-205, May 19991.
    • (1991) IEEE Electron Device Lett. , vol.12 , pp. 203-205
    • Hack, M.1    Lewis, A.G.2
  • 12
    • 0001001861 scopus 로고
    • Output characteristics of short-channel polycrystalline silicon thin-film transistors
    • Mar.
    • C. A. Dimitriadis and D. H. Tassis, "Output characteristics of short-channel polycrystalline silicon thin-film transistors," J. Appl. Phys., vol. 77, pp. 2177-2183, Mar. 1995.
    • (1995) J. Appl. Phys. , vol.77 , pp. 2177-2183
    • Dimitriadis, C.A.1    Tassis, D.H.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.