Back- and front-interface trap densities evaluation and stress effect of poly-Si TFT

IDW '07 - Proceedings of the 14th International Display Workshops

Volumn 2, Issue , 2007, Pages 477-480

  Takatori, K ^a   Asada, H ^a   Kaneko, S ^a  

^a NEC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHARGE DENSITY; FILM THICKNESS; POLYSILICON; STRESS ANALYSIS; THRESHOLD VOLTAGE;

BACK-INTERFACE TRAP DENSITY; TEMPERATURE STRESS; TRAP DENSITY;

THIN FILM TRANSISTORS;

EID: 43349101764     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (8)

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