Determination of excitation temperature and vibrational temperature of the N2(C 3Πu, ν′) state in Ne-N 2 RF discharges

Plasma Sources Science and Technology

Volumn 17, Issue 2, 2008, Pages

  Rehman, N U ^a   Khan, F U ^b   Naveed, M A ^a   Zakaullah, M ^a  

^a QUAID I AZAM UNIVERSITY   (Pakistan)

^b GOMAL UNIVERSITY   (Pakistan)

Author keywords

[No Author keywords available]

Indexed keywords

BOLTZMANN EQUATION; ELECTRIC EXCITATION; LINEARIZATION; OPTICAL EMISSION SPECTROSCOPY; PLASMA APPLICATIONS;

BOLTZMANN'S PLOT; EXCITATION TEMPERATURE; VIBRATIONAL TEMPERATURE;

ELECTRIC DISCHARGES;

EID: 43149122697     PISSN: 09630252     EISSN: 13616595     Source Type: Journal    
DOI: 10.1088/0963-0252/17/2/025005     Document Type: Article

References (41)

1. Boumans P W J M Introduction to atomic emission spectroscopy Inductively Coupled plasma Emission Spectroscopy 1 (New York: Wiley) pp 1-44
2. Mermet J M 1987 Spectroscopic diagnostics: basic concept Inductively Coupled Plasma Emission Spectroscopy 2 ed P W J M Boumans (New York: Wiley) pp 353-86
3. Griem H R 1964 Temperature measurements Plasma Spectroscopy (New York: McGraw-Hill) pp 267-96
4. Cacciatore M, Capitelli M and Gorse C 1982 Chem. Phys. 66 141-51
5. Gorse C and Capitelli M 1987 J. Appl. Phys. 62 4072-6
6. Benedictis S De and Cramarossa F 1987 Chem. Phys. 112 363-72
7. Massabieaux B, Plain A, Ricard A and Capitelli M 1983 J. Phys. B: At. Mol. Phys. 16 1863-74
8. Bibinov N K, Fateev A A and Wiesemann K 2001 J. Phys. D: Appl. Phys. 34 1819-26
9. Herzberg G 1950 Molecular spectra and molecular structure Spectra of Diatomic Molecules vol 1 2nd edn (New York: Litton)
10. Popa S D 1996 J. Phys. D: Appl. Phys. 29 416-18
11. Bai K H, You S J, Uhm H S and Chang H Y 2001 Appl. Phys. Lett. 79 1596-8
12. Lofthus A and Krupenie P H 1977 J. Phys. Chem. Ref. Data 6 113-307
13. Itikama Y, Hayashi M, Ichimura A and Onda K 1986 J. Phys. Chem. Ref. Data 15 985-1010
14. Hino T, Yamauchi Y, Ono J and Hirohata Y 2004 Vacuum 74 467-71
15. Cown R D and Dieke G H 1948 Rev. Mod. Phys. 20 418-55
16. Boivin R F, Kline J L and Scime E E 2001 Phys. Plasmas 8 5303-14
17. Biloiu C, Ehrich H and Musa G 2001 J. Vac. Sci. Technol. A 19 757-61
18. http://physics.nist.gov/cgi-bin/ASD
19. Raju G G 2006 IEEE Electr. Insul. Mag. 22 5-23
20. Naveed M A, Qayyum A, Sujaat A and Zakaullah M 2006 Phys. Lett. A 359 499-503
21. Galimberti I, Hepworth J K and Klewe R C 1974 J. Phys. D: Appl. Phys. 7 880-98
22. Hartmann G and Galimberti I 1975 J. Phys. D: Appl. Phys. 8 670-80
23. Golubovskii Yu B, Telezhko V M and Stoyanov D G 1990 Opt. Spektrosk. 69 332
24. Golubovskii Yu B, Telezhko V M and Stoyanov D G 1990 Opt. Spectrosc. 69 195 (Engl. transl.)
25. Simek M, Babicky V, Clupek M, Benedictis De, Dilecce G and Sunka P 1998 J. Phys. D: Appl. Phys. 31 2591-602
26. Gilmore F R and Laher R R 1992 J. Phys. Chem. Ref. Data 21 1005-107
27. Levanton J and Amorim J 2005 J. Phys. D: Appl. Phys. 38 2204-10
28. Hinriques J, Tatarova E, Guerra V and Ferreira C M 2002 J. Appl. Phys. 91 5632
29. Brandenburg R, Maiorov V A and Golubovskii Yu B 2005 J. Phys. D: Appl. Phys. 38 2178-97
30. Levanton J, Amorim J and Ricard A 2002 J. Phys. D: Appl. Phys. 35 689-99
31. Hasegawa T and Wineffordner J D 1987 Spectrochim. Acta B 42 651-63
32. Benedictis S De and Dilecce G 1995 Chem. Phys. 192 149-62
33. Piper L G 1988 J. Chem. Phys. 88 231-9
34. Herron J 1999 J. Chem. Phys. Ref. Data 28 1453-83
35. Qayyum A, Shaista Z, Naveed M A, Rehman N U, Ghauri S A and Zakaullah M 2007 J. Quant. Spectrosc. Radiat. Transfer 107 361-71
36. Joshipura K N and Antony B K 2001 Phys. Lett. A 289 323-8
37. Lieberman M A and Lichtenberg A J 1994 Principles of Plasma Discharges and Material Processing (New York: Wiley) pp 234-6
38. Levanton J, Amorim J, Monna V, Nagi J and Ricard A 2004 Eur. Phys. J. Appl. Phys. 26 59-64
39. Boffard J B, Lin C C and DeJoseph C A Jr 2004 J. Phys. D: Appl. Phys. 37 R143-61
40. Crolly G and Oechsner H 2001 Eur. Phys. J. Appl. Phys. 15 49-56
41. Gordillo-Vzquez F J, Camero M and Gómez-Aleixandre C 2006 Plasma Sources Sci. Technol. 15 42-51