Enhancement of reactive species density in nitrogen plasma by mixture of helium and nitridation experiment for silicon

Vacuum

Volumn 74, Issue 3-4 SPEC. ISS., 2004, Pages 467-471

  Hino, T ^a   Yamauchi, Y ^a   Ono, J ^a   Hirohata, Y ^a  

^a HOKKAIDO UNIVERSITY   (Japan)

Author keywords

Addition of helium; ECR nitrogen plasma; Enhancement of reactive species; Nitridation; Nitridation of silicon

Indexed keywords

ELECTRON CYCLOTRON RESONANCE; ELECTRONS; HELIUM; MIXTURES; NITRIDES; NITROGEN; SILICON; SYNTHESIS (CHEMICAL);

ADDITION OF HELIUM; ECR NITROGEN PLASMA; ENHANCEMENT OF REACTIVE SPECIES; NITRIDATION OF SILICON;

PLASMA APPLICATIONS;

EID: 2442476040     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2004.01.016     Document Type: Article

References (5)

1. Hino T., Fujita I., Nishikawa M. Plasma Sources Sci Technol. 5:1996;424-428.
2. Konuma M., Matsumoto O. J Less-Common Met. 52:1977;149-153.
3. Konuma M., Matsumoto O. J Less-Common Met. 55:1977;97-101.
4. Matsumoto O., Konuma M., Kanzaki Y. J Less-Common Met. 84:1982;157-163.
5. Hino T., Harada M., Yamauchi Y., Hirohata Y. Surf Coat Technol. 108-109:1998;312-316.