Adsorption and desorption studies of glycine and benzotriazole during Cu oxidation in a chemical mechanical polishing bath

Journal of the Electrochemical Society

Volumn 155, Issue 6, 2008, Pages

  Lin, Jeng Yu ^a,b,c   West, Alan C ^b,c   Wan, Chi Chao ^a,c  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

^b Department of Earth and Environmental Sciences   (United States)

^c ELECTROCHEMICAL SOCIETY

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; CHEMICAL MECHANICAL POLISHING; COPPER; DESORPTION; ELECTROCHEMICAL ELECTRODES; ELECTROCHEMICAL OXIDATION;

BENZOTRIAZOLE (BTAH); MICROFLUIDIC DEVICE; OPEN-CIRCUIT POTENTIAL (OCP);

AMINO ACIDS;

EID: 43049111789     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2905817     Document Type: Article

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