Room temperature crystallization by RF plasma

Thin Solid Films

Volumn 516, Issue 14, 2008, Pages 4490-4494

  Ohsaki, H ^a   Shibayama, Y ^a   Suzuki, M ^a   Kinbara, A ^a   Yashiro, H ^b   Watanabe, T ^a  

^a UNIVERSITY OF TOKYO   (Japan)

^b RIGAKU CORPORATION   (Japan)

Author keywords

Amorphous silicon; Crystallization; Indium oxide; Photocatalysis; Plasma processing; Titanium oxide; X ray diffraction

Indexed keywords

AMORPHOUS SILICON; CRYSTALLIZATION; PHOTOCATALYSIS; PLASMA APPLICATIONS; TITANIUM OXIDES; X RAY DIFFRACTION;

AMORPHOUS THIN FILMS; INDIUM OXIDE; RF PLASMA;

THIN FILMS;

EID: 42649108775     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.06.015     Document Type: Article

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