Plasma treatment for crystallization of amorphous thin films

Thin Solid Films

Volumn 502, Issue 1-2, 2006, Pages 63-66

  Ohsaki, H ^a   Shibayama, Y ^a   Nakajim, A ^b   Kinbara, A ^a   Watanabe, T ^a  

^a UNIVERSITY OF TOKYO   (Japan)

^b TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Crystallization; Indium oxide; Plasma processing; Titanium oxide; X ray diffraction

Indexed keywords

CRYSTALLIZATION; INDIUM COMPOUNDS; PLASMA APPLICATIONS; THIN FILMS; TITANIUM OXIDES;

GAS PRESSURE; INDIUM OXIDE; PLASMA PROCESSING;

AMORPHOUS FILMS;

EID: 33344455648     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.07.244     Document Type: Conference Paper

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