Evidence of local and global scaling regimes in thin films deposited by sputtering: An atomic force microscopy and electrochemical study

Applied Physics Letters

Volumn 81, Issue 26, 2002, Pages 4922-4924

  Souza Cruz, Tersio G ^a   Kleinke, M U ^a   Gorenstein, A ^a  

^a UNIVERSITY OF CAMPINAS   (Brazil)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CYCLIC VOLTAMMETRY; ELECTROCHEMISTRY; SPUTTER DEPOSITION;

RADIO FREQUENCY (RF);

THIN FILMS;

EID: 0037164902     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1530739     Document Type: Article

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