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Volumn 17, Issue 4, 2008, Pages 1394-1399

Effects of deposition pressure and plasma power on the growth and properties of boron-doped microcrystalline silicon films

Author keywords

Boron doped c Si:H films; Dark conductivity; Raman crystallinity; Thin film solar cells

Indexed keywords

MICROCRYSTALLINE SILICON; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SOLAR CELLS;

EID: 42449141465     PISSN: 16741056     EISSN: None     Source Type: Journal    
DOI: 10.1088/1674-1056/17/4/040     Document Type: Article
Times cited : (9)

References (23)
  • 19


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.