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Volumn 17, Issue 4, 2008, Pages 1394-1399
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Effects of deposition pressure and plasma power on the growth and properties of boron-doped microcrystalline silicon films
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Author keywords
Boron doped c Si:H films; Dark conductivity; Raman crystallinity; Thin film solar cells
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Indexed keywords
MICROCRYSTALLINE SILICON;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
SOLAR CELLS;
DARK CONDUCTIVITY;
RAMAN CRYSTALLINITY;
THIN FILM DEVICES;
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EID: 42449141465
PISSN: 16741056
EISSN: None
Source Type: Journal
DOI: 10.1088/1674-1056/17/4/040 Document Type: Article |
Times cited : (9)
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References (23)
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