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Volumn 115, Issue 1, 2004, Pages 60-66

Fabrication of SOI-based nano-gratings for Moiré measurement using focused ion beam

Author keywords

Focused ion beam; MEMS; Moir fringe; Nano grating; NEMS; Scanning electron microscope; Silicon on insulator

Indexed keywords

ACTUATORS; ATOMIC FORCE MICROSCOPY; FABRICATION; ION BEAMS; MICROELECTROMECHANICAL DEVICES; MOIRE FRINGES; NANOSTRUCTURED MATERIALS; SCANNING ELECTRON MICROSCOPY; SENSORS;

EID: 4243108307     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.sna.2004.03.034     Document Type: Article
Times cited : (18)

References (10)
  • 1
    • 0036538683 scopus 로고    scopus 로고
    • A modified Moiré technique for three-dimensional surface topography
    • Acquisto L., Fratini L., Siddiolo A. A modified Moiré technique for three-dimensional surface topography. Measur. Sci. Technol. 13:2002;613-622.
    • (2002) Measur. Sci. Technol. , vol.13 , pp. 613-622
    • Acquisto, L.1    Fratini, L.2    Siddiolo, A.3
  • 2
    • 0036902735 scopus 로고    scopus 로고
    • Investigation of strain in microstructures by a novel Moiré method
    • Li B., Xie H., et al. Investigation of strain in microstructures by a novel Moiré method. J. Microelectromech. Syst. 11(6):2002;829-836.
    • (2002) J. Microelectromech. Syst. , vol.11 , Issue.6 , pp. 829-836
    • Li, B.1    Xie, H.2
  • 3
    • 0036681733 scopus 로고    scopus 로고
    • High resolution AFM scanning Moiré method and its application to the micro-deformation in the BGA electronic package
    • Xie H., Asundi A., et al. High resolution AFM scanning Moiré method and its application to the micro-deformation in the BGA electronic package. Microelectron. Reliab. 42(8):2002;1219-1227.
    • (2002) Microelectron. Reliab. , vol.42 , Issue.8 , pp. 1219-1227
    • Xie, H.1    Asundi, A.2
  • 5
    • 0037412068 scopus 로고    scopus 로고
    • Focused ion beam Moiré method
    • Xie H., Li B., et al. Focused ion beam Moiré method. Opt. Laser Eng. 40(3):2003;163-177.
    • (2003) Opt. Laser Eng. , vol.40 , Issue.3 , pp. 163-177
    • Xie, H.1    Li, B.2
  • 7
    • 4243071303 scopus 로고    scopus 로고
    • A new SOI manufacturing technology using atomic layer cleaving
    • Section 7
    • F. Henley, M. Current, A new SOI manufacturing technology using atomic layer cleaving, Semiconductor Fabtech, 12th ed., Section 7, 2000, pp. 201-205.
    • (2000) Semiconductor Fabtech, 12th Ed. , pp. 201-205
    • Henley, F.1    Current, M.2
  • 9
    • 0011525512 scopus 로고    scopus 로고
    • Optimal design of a tuning fork gyroscope and its testing experiment
    • 27-29 March, San Diego, CA, USA
    • D. Yan, T.E.H. Francis, W. Yu, Y. Xu, Optimal design of a tuning fork gyroscope and its testing experiment, Modeling and Simulation of Microsystems, 27-29 March 2000, San Diego, CA, USA, pp. 621-623.
    • (2000) Modeling and Simulation of Microsystems , pp. 621-623
    • Yan, D.1    Francis, T.E.H.2    Yu, W.3    Xu, Y.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.