Resistless mask structuring using an ion multi-beam projection pattern generator

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6730, Issue , 2007, Pages

  Butschke, Joerg ^a   Irmscher, Mathias ^a   Letzkus, Florian ^a   Loeschner, Hans ^b   Nedelmann, Lorenz ^a   Platzgummer, Elmar ^b  

^a Institut fur Mikroelektronik Stuttgart   (Germany)

^b IMS NANOFABRICATION AG   (Austria)

Author keywords

Chrome; Hard mask; Ion beam; Mask process; Pattern generation

Indexed keywords

ION BEAMS; PATTERN RECOGNITION;

CHEMICALLY AMPLIFIED RESISTS (CAR); HARD MASKS; LINE EDGE ROUGHNESS (LER);

MASKS;

EID: 42149176575     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.742797     Document Type: Conference Paper

References (7)

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3. Elmar Platzgummer et al..: "Projection Mask-Less Patterning (PMLP) for the fabrication of leading-edge complex masks and nano-imprint templates", SPIE Photomask / BACUS, Sept 17-21, 2007, Monterey, California, USA, t.b.p. in Proc. SPIE Vol. 6730-108.
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7. Anatol Schwersenz et. al.: "Evaluation of most recent chemically amplified resists for high resolution direct write using a Leica SB350 variable shaped beam writer", Proc. of SPIE - Vol. 6153, 2006