Photomask dry etching techniques for hard mask

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6283 II, Issue , 2006, Pages

  Kwon, Sung Won ^a   Park, Young Ju ^a   Kim, Sung Yoon ^a   Lee, Han Shin ^a   Kwon, Hyuk Joo ^a   Choi, Seung Woon ^a   Han, Woo Sung ^a  

^a SAMSUNG Electronics   (South Korea)

Author keywords

Etch bias; Hard mask; Photomask

Indexed keywords

DRY ETCHING; LOADING; MATERIALS SCIENCE; PLASMAS;

ETCH BIAS; HARD MASK; PHOTOMASK;

PHOTOLITHOGRAPHY;

EID: 33748032404     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.681756     Document Type: Conference Paper

References (3)

1. Tom Coleman, and Peter Buck, "Plasma etching of chromium films in the fabrication of photomasks"
2. Harry J. Levenson, "Principle of Lithography" p.248, 2001
3. Mark Mueller, Serguei Komarov, and Ki-Ho Baik, "High-Resolution Etching of MoSi using Electron Beam patterned chemically amplified resist" Photomask Japan 2003, SPIE Vol. 5130-237.