Evaluation of most recent chemically amplified resists for high resolution direct write using a leica SB350 variable shaped beam writer

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6153 II, Issue , 2006, Pages

  Schwersenz, Anatol ^a   Beyer, Dirk ^d   Boettcher, Monika ^d   Choi, Kang Hoon ^b   Denker, Ulrich ^d   Hohle, Christoph ^c   Irmscher, Mathias ^a   Kamm, Frank Michael ^b   Kliem, Karl Heinz ^d   Kretz, Johannes ^b   Sailer, Holger ^a   Thrum, Frank ^b  

^a Institut fur Mikroelektronik Stuttgart   (Germany)

^b Infineon Technologies Dresden GmbH and Co OHG   (Germany)

^c INFINEON TECHNOLOGIES AG   (Germany)

^d Vistec Electron Beam GmbH   (Germany)

Author keywords

Chemically amplified resist; e beam direct writing; Variable shaped beam

Indexed keywords

CHEMICALLY AMPLIFIED RESIST; E-BEAM DIRECT WRITING; VARIABLE-SHAPED BEAM;

AMPLIFICATION; ELECTRON BEAMS; OPTIMIZATION; PHOTOLITHOGRAPHY; SENSITIVITY ANALYSIS; VACUUM;

PHOTORESISTS;

EID: 33745630370     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.655497     Document Type: Conference Paper

References (2)

1. J. Todeschini, L. Pain, S. Manakli, B. Icard, V. Dejonghe, B. Minghetti, M. Jurdit, D. Henry, V. Wang "Electron beam direct write process development for sub 45nm CMOS manufacturing", SPIE Microlithography 2005, Santa Clara, CA, USA.
2. P. Hudek, D. Beyer, T. Groves, O. Fortagne, W.J. Dauksher, D. Mancini, K. Nordquist, D.J. Resnick "Shaped Beam Technology for Nano-Imprint Mask Lithography", EMC 2004, Dresden, Germany, Januar 12 - 14