Automated aerial image based CD metrology initiated by pattern marking with photomask layout data

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6607, Issue PART 2, 2007, Pages

  Davis, Grant ^a   Choi, Sun Young ^b   Jung, Eui Hee ^b   Seyfarth, Arne ^c   Van Doornmalen, Hans ^c   Poortinga, Eric ^d  

^a MENTOR GRAPHICS CORPORATION   (United States)

^b SAMSUNG Electronics   (South Korea)

^c CARL ZEISS SMT AG   (Germany)

^d Carl Zeiss Vision Inc USA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DATA STRUCTURES; LITHOGRAPHY; PHOTOMASKS; SENSITIVITY ANALYSIS;

IMAGE MEASUREMENTS;

PATTERN MATCHING;

LITHOGRAPHY; PARTICLE BOARDS;

EID: 36248937101     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.728993     Document Type: Conference Paper

References (7)

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4. Poortinga, et al, "Investigation of Hyper-NA Scanner Emulation for Photomask CDU Performance", Proc. European Mask and Lithography Conference, 2007.
5. nd generation: a system for the 65nm node including immersion", Proc. SPIE Vol. 5853, Photomask and Next Generation Lithography Mask Technology, 2005.
6. Poortinga, et al, "Improved prediction of Across Chip Linewidth Variation (ACLV) with photomask aerial image CD metrology", Proc. SPIE Vol. 6349, Photomask Technology, 2006.
7. Lucas, et al, "Reticle enhancement verification for the 65nm and 45nm nodes", Proc. SPIE 6156, 61560R, 2006