Through-pitch and through-focus characterization of AAPSM for ArF immersion lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6281, Issue , 2006, Pages

  Konishi, Toshio ^a   Kojima, Yosuke ^a   Okuda, Yoshimitsu ^a   Philipsen, Vicky ^b   Leunissen, Leonardus H A ^b   Van Look, Lieve ^b  

^a TOPPAN PRINTING CO LTD   (Japan)

^b IMEC   (Belgium)

Author keywords

Alternating aperture phase shift mask; Image placement error; Immersion lithography; Rigorous 3D mask simulation

Indexed keywords

COMPUTER SIMULATION; ERROR ANALYSIS; IMAGE ENHANCEMENT; LOGIC GATES; OPTICAL RESOLVING POWER; PHASE SHIFT; PHOTOLITHOGRAPHY;

ALTERNATING APERTURE PHASE-SHIFT MASK; IMAGE PLACEMENT ERRORS; IMMERSION LITHOGRAPHY; MASK ERROR ENHANCEMENT FACTOR (MEEF); RIGOROUS 3D MASK SIMULATION;

MASKS;

EID: 33748055787     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.692802     Document Type: Conference Paper

References (4)

1. Armen Kroyan and Hua-yu Liu, "Effects of alternating aperture PSM Design on Image Imbalance for 65nm Technology" Proc. of SPIE,Vol.4889,pp 1217-1226(2002)
2. Toshio.Konishi, et.al., "Study of alternating phase shift mask structure for 65nm Technology", Proc. of SPIE,Vol.5256,pp880-888(2003)
3. Yosuke Kojima, et.al., "Study of Alternating Phase-Shift Mask structure for ArF lithography", Proc. of SPIE, Vol.5456, pp570-577(2004)
4. Lieve Van Look, et al., "Image imbalance compensation in alternating Phase-Shift Masks towards the 45 node through-pitch imaging", Proc. of SPIE , Vol.5992-65 (2005)