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Volumn 6730, Issue , 2007, Pages

The study of CD error in mid-local pattern area caused by develop loading effect

Author keywords

CD uniformity; Chemical flare; Develop loading; Dissolution product

Indexed keywords

CHIP SCALE PACKAGES; DISSOLUTION; ELECTRON BEAMS; ERROR CORRECTION;

EID: 42149156254     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.746565     Document Type: Conference Paper
Times cited : (3)

References (6)
  • 2
    • 33846608259 scopus 로고    scopus 로고
    • Chemical flare long range proximity effects in photomask manufacturing with chemically amplified resists
    • SPIE
    • D. Sullivan, Y. Okawa, K. Sugawara, Z. Benes, J. Kotani, "Chemical flare long range proximity effects in photomask manufacturing with chemically amplified resists", Proceedings of SPIE Vol. 6349, SPIE (2006)
    • (2006) Proceedings of SPIE , vol.6349
    • Sullivan, D.1    Okawa, Y.2    Sugawara, K.3    Benes, Z.4    Kotani, J.5
  • 6
    • 11844273304 scopus 로고    scopus 로고
    • Investigations on microloading effect : A parallel approach to PGSD (Proximity Gap Suction Development)
    • D. Courboin, J.W. Choi, S.H. Jung, S.H. Baek, L.J. Kim, C.N. Ahn, H.S. Kim, "Investigations on microloading effect : A parallel approach to PGSD (Proximity Gap Suction Development)", SPIE Vol. 5446, 106-114 (2004)
    • (2004) SPIE , vol.5446 , pp. 106-114
    • Courboin, D.1    Choi, J.W.2    Jung, S.H.3    Baek, S.H.4    Kim, L.J.5    Ahn, C.N.6    Kim, H.S.7


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.