Simulation for effect of process parameters on surface profile in thick film photolithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6724, Issue , 2007, Pages

  Xionggui, Tang ^a   Heping, Li ^a   Jingkun, Liao ^a   Yongzhi, Liu ^a   Yongkang, Guo ^b  

^a UNIVERSITY OF ELECTRONIC SCIENCE AND TECHNOLOGY OF CHINA   (China)

^b SICHUAN UNIVERSITY   (China)

Author keywords

Effect of process parameters; Numerical simulation; Surface profile; Thick film photolithography

Indexed keywords

MICROSTRUCTURE; PARAMETER ESTIMATION; THICK FILMS; WAVELENGTH;

EFFECT OF PROCESS PARAMETERS; SURFACE PROFILE; THICK FILM PHOTOLITHOGRAPHY;

PHOTOLITHOGRAPHY;

EID: 42149153756     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.782692     Document Type: Conference Paper

References (7)

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