Etch, reticle, and track CD fingerprint corrections with local dose compensation

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5755, Issue , 2005, Pages 107-118

  Van Der Laan, Hans ^a   Carpaij, Rene ^a   Krist, Jouke ^a   Noordman, Oscar ^a   Van Dommelen, Youri ^a   Van Schoot, Jan ^a   Blok, Frans ^a   Van Os, Christian ^a   Stegeman, Sander ^a   Hoogenboom, Tom ^a   Hickman, Craig ^b   Byers, Erik ^b   Gugel, Troy ^a  

^a ASML   (Netherlands)

^b MICRON TECHNOLOGY INC   (United States)

Author keywords

APC; CD control; CD uniformity; Dose Correction; Feedback control; Optical Lithography

Indexed keywords

APC; CD CONTROL; CD UNIFORMITY; DOSE CORRECTION;

BUDGET CONTROL; DATA STORAGE EQUIPMENT; ETCHING; FEEDBACK CONTROL; PHOTOLITHOGRAPHY; QUALITY CONTROL;

PROCESS CONTROL;

EID: 25144482322     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.602129     Document Type: Conference Paper

References (8)

1. International Technology Roadmap for Semiconductors (ITRS), 2004 Edition, SIA, http://www.itrs.net/Common/2004Update/2004Update.htm
2. J. van Schoot et al., "Mask error factor: causes and implications for process latitude", Proc. SPIE, vol. 3679, pp199 (1999)
3. D. Flagello, et al., "Optical Lithography in the sub-50nm regime", Proc. SPIE, vol. 5377, pp21-33 (2004)
4. J. van Schoot et al., "CD uniformity Improvements by Active Scanner Corrections", Proc. SPIE, vol. 4691, pp304-314 (2002)
5. André Engelen, et al., "Implementation of Pattern Specific Illumination Pupil Optimization on Step & Scan Systems", Proc. SPIE, vol. 5377, pp 1323-1333 (2004)
6. D. Flagello, et al., "Optimizing and Enhancing Optical Systems to Meet the Low k1 Challenge", Proc. SPIE, vol. 5040, pp139 (2003)
7. I. Pollentier, et al., "In-line lithography cluster monitoring and control using integrated scatterometry", Proc. SPIE, vol. 5378, pp105-115 (2004)
8. P. Vanoppen et al., "Analysis of Full Wafer/Full Batch CD uniformity Using Electrical Line Width Measurements", Proc SPIE, vol. 4404, pp33 (2001)