Optimizing defect inspection strategy through the use of design aware database control layers

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6730, Issue , 2007, Pages

  Stoler, Dvori ^a   Ruch, Wayne ^a   Ma, Weimin ^a   Chakravarty, Swapnajit ^a   Liu, Steven ^a   Morgan, Ray ^b   Valadez, John ^b   Moore, Bill ^b   Burns, John ^b  

^a KLA TENCOR CORPORATION   (United States)

^b SYNOPSYS INC   (United States)

Author keywords

Automation; CATS; Data base; DRC; High resolution; Mask inspection; MDP; MEEF; MRC; Sensitivity Control Layer (SCL); Verification

Indexed keywords

MASK INSPECTION; SENSITIVITY CONTROL LAYER (SCL);

DATABASE SYSTEMS; INSPECTION; OPTIMIZATION; SYSTEMS ANALYSIS;

AUTOMATION;

EID: 42149102800     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.747302     Document Type: Conference Paper

References (5)

1. Keck, M. et al., "Mask Manufacturing Rule Check: How to Save Money in Your Mask Shop", Proc. SPIE Vol. 4186, 2001, pp. 114-118
2. Howard, C. et al., "Using manufacturing rule check to prescreen reticle inspection databases", Proc. SPIE Vol. 4186, 2001, pp. 119-128
3. Moore, B. et al., "Advanced non-disruptive manufacturing rule checks (MRC)", Proc. SPIE Vol 4186, 2006
4. Sakata, W. et al., "Mask rule check for inspection og leading-edge photomask", Proc. SPIE Vol 5992, 2005
5. Buck, P. et al., "Mask manufacturing rules checking (MRC) as a DFM strategy", Proc. SPIE Vol 6521, 2007