Advanced non-disruptive manufacturing rule checks (MRC)

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6349 II, Issue , 2006, Pages

  Moore, Bill ^a   Do, Tanya ^a   Morgan, Ray E ^a  

^a SYNOPSYS INC   (United States)

Author keywords

Automation; CATS; DRC; Mask inspection; MDP; MRC; Verification

Indexed keywords

DESIGN RULE CHECKING (DRC) SOFTWARE; DESIGN VERIFICATION; MASK DATA PREPARATION (MDP); MASK INSPECTION;

COMPUTER AIDED SOFTWARE ENGINEERING; COST EFFECTIVENESS; DATA STRUCTURES; JOB ANALYSIS; LOGIC PROGRAMMING; MASKS; SEMICONDUCTOR DEVICE MANUFACTURE;

PHOTOLITHOGRAPHY;

EID: 33846590570     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.692945     Document Type: Conference Paper

References (5)

1. Mason, M. et al, "Mask design rules (45nm): time for standardization", Proc. SPIE Vol. 5992, 2005, pp. 98-107
2. Keck, M. et al., "Mask Manufacturing Rule Check: How to Save Money in Your Mask Shop", Proc. SPIE Vol. 4186, 2001, pp. 114-118
3. Howard, C. et al., "Using manufacturing rule check to prescreen reticle inspection databases", Proc. SPIE Vol. 4186, 2001, pp. 119-128
4. Badger, K. et al., "Generating mask inspection rules for advanced lithography", Proc. SPIE Vol. 5992, 2005, pp. 49-57
5. Sheldon, G., et al., "Mask industry assessment: 2005", Proc. SPIE Vol. 5992, 2005, pp. 1-11