Mask rule check for inspection of leading-edge photomask

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5992, Issue 2, 2005, Pages

  Sakata, Wakahiko ^a   Yamasaki, Kiyoshi ^a   Narukawa, Shogo ^a   Hayashi, Naoya ^a  

^a DAI NIPPON PRINTING CO LTD   (Japan)

Author keywords

DNIR(Do Not Inspection Region); Inspection; Mask Rule Check; MRC

Indexed keywords

DATA PROCESSING; LARGE SCALE SYSTEMS; PROBLEM SOLVING; PRODUCT DEVELOPMENT;

DNIR(DO NOT INSPECTION REGION); MASK RULE CHECK; MRC;

MASKS;

EID: 33644587870     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.633850     Document Type: Conference Paper

References (0)