Mask Manufacturing Rules Checking (MRC) as a DFM strategy

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6521, Issue , 2007, Pages

  Buck, Peter ^a   Gladhill, Richard ^a   Straub, Joseph ^a  

^a Toppan Photomasks Inc   (United States)

Author keywords

DFM; Mask data preparation; Mask manufacturing rules; MRC

Indexed keywords

MASK DATA PREPARATION; MASK MANUFACTURING RULES;

ERROR ANALYSIS; INTEGRATED CONTROL; MATHEMATICAL TRANSFORMATIONS; PROBLEM SOLVING;

AUTOMATIC TEST PATTERN GENERATION;

EID: 35148881617     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.712373     Document Type: Conference Paper

References (4)

1. th Annual BACUS Symposium on Photomask Technology, 2005.
2. th Annual BACUS Symposium on Photomask Technology, 2006.
3. United States Patent 6,966,047B 1, "Capturing Designer Intent in Reticle Inspection"
4. United States Patent Applied For, "Method and System for Dispositioning Defects in a Photomask"