Initial stages of ruthenium film growth in plasma-enhanced atomic layer deposition

Journal of the Electrochemical Society

Volumn 155, Issue 5, 2008, Pages

  Kwon, Se Hun ^a   Kwon, Oh Kyum ^a   Kim, Jin Hyock ^b   Oh, Heung Ryong ^a   Kim, Kwang Ho ^c   Kang, Sang Won ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

^b Hynix Semiconductor Inc   (South Korea)

^c Pusan National University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; ATOMIC LAYER DEPOSITION; RUTHENIUM COMPOUNDS; TITANIUM NITRIDE;

RUTHENIUM FILMS; SATURATED ADSORPTION;

FILM GROWTH;

EID: 41849103848     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2868779     Document Type: Article

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