SCOPUS 정보 검색 플랫폼

Volumn 2, Issue , 2006, Pages 1650-1652

Preparation of nanocrystalline silicon carbide thin films by hot-wire chemical vapor deposition at various filament temperature

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; FILM PREPARATION; NANOCRYSTALLINE SILICON; SILICON CARBIDE; THERMAL EFFECTS; X RAY DIFFRACTION;

FILAMENT TEMPERATURE; HOT WIRE CHEMICAL VAPOR DEPOSITION;

THIN FILMS;

EID: 41749115469 PISSN: None EISSN: None Source Type: Conference Proceeding
DOI: 10.1109/WCPEC.2006.279805 Document Type: Conference Paper

Times cited : (2)

References (9)

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