Very-high-frequency thermal microplasma jet for the rapid crystallization of amorphous silicon

Thin Solid Films

Volumn 516, Issue 13, 2008, Pages 4456-4461

  Shirai, Hajime ^a   Sakurai, Yusuke ^a   Yeo, Mina ^a   Haruta, Koji ^a   Kobayashi, Tomohiro ^b   Ishikawa, Tatsuo ^c  

^a SAITAMA UNIVERSITY   (Japan)

^b INST OF PHYS AND CHEMICAL RESEARCH   (Japan)

^c HORIBA LTD   (Japan)

Author keywords

Amorphous silicon; Atmospheric pressure plasma; Crystallization; Plasma annealing; Polycrystalline silicon; Solar cell; TFT

Indexed keywords

CRYSTALLIZATION; POLYSILICON; THIN FILM TRANSISTORS;

ATMOSPHERIC PRESSURE PLASMA; NITROGEN IMPURITY; PLASMA ANNEALING; TRANSLATIONAL VELOCITY;

AMORPHOUS SILICON;

EID: 41549158156     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.10.066     Document Type: Article

References (17)

1. Armiento C.A., and Prince F.C. Appl. Phys. Lett. 48 (1986) 1623
2. Sameshima T., Hara M., and Usui S. Jpn. J. Appl. Phys. 28 (1989) 789
3. Yoon S.Y., Park S.J., Kim K.H., and Jang J. Thin Solid Films 383 (2001) 34
4. Howell R.S., Stewart M., Sambit S.V., Saha S.K., and Hatalis M.K. IEEE Electron Device Lett. 21 (2000) 70
5. Matsuda A. J. Non-Cryst. Solids 1 (2004) 338-340
6. Andoh N., and Sameshima T. Solid State Phenomena 93 (2003) 179
7. Lee J.W., Shimizu K., and Hanna J. J. Non-Cryst. Solids 173 (2004) 338-340
8. Asada T., Sakamoto K., Watanabe T., Sameshima T., and Higashi S. Jpn. J. Appl. Phys. 39 (2000) 3883
9. Sakurai Y., Kobayashi T., Hasegawa Y., and Shirai H. Jpn. J. Appl. Phys. 44 (2005) L749
10. Sakurai Y., Ryo M., Kobayashi T., and Shirai H. J. Non-Cryst. Solids (2006)
11. Launtenschlagen P., Carriga M., and Cardona M. Phys. Rev. B 36 (1987) 4821
12. Jellison Jr. G.E., and Modine F.A. Appl. Phys. Lett. 69 (1996) 2137
13. Jellison Jr. G.E. Opt. Mater. 1 (1992) 41
14. Stiffler S.R., Thomson M.O., and Peercy P.S. Phys. Rev. B43 (1999) 9851
15. Hatano M., Lee M.H., Moon S.J., Suzuki K., and Grigoropoulos C.P. J. Appl. Phys. 87 (2000) 36
16. Evans P.V., Devaud G., Kelly T.F., and Kim Y.-W. Acta Metall. Mater. 38 (1990) 719
17. Shirai H., Sakurai Y., Ryo M., Kobayashi T., and Ishikawa T. E. J. Appl. Phys. (2007) on line