Study on dielectric and tunable properties of Cr-doped Ba0 .6Sr0.4TiO3 thin films by rf sputtering

Journal of Materials Science

Volumn 43, Issue 9, 2008, Pages 3162-3165

  Hu, Mei Feng ^a   Zhuo, Yue ^a   Wang, Sheng Xiang ^a   Tian, Yu ^a  

^a WUHAN UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; DIELECTRIC PROPERTIES; MAGNETRON SPUTTERING; MORPHOLOGY; X RAY DIFFRACTION;

FIGURE OF MERIT (FOM); TUNABILITY; TUNABLE PROPERTIES;

THIN FILMS;

EID: 41549115780     PISSN: 00222461     EISSN: 15734803     Source Type: Journal    
DOI: 10.1007/s10853-008-2538-9     Document Type: Article

References (15)

1. Baniecki JD, Shioga T, Kurihara K (2003) Mater Res Soc Sym Proc 748:441
2. Korn DS, Wu HD (1999) Intger Ferroelectr 24:215
3. Knauss LA, Pond JM, Horwitz SJ, Chrisey DB (1996) Appl Phys Lett 69:25
4. Cole MW, Joshi PC, Ervin MH, Wood MC, Pfeffer RL (2000) Thin Solid Films 34:374
5. Kawahara T, Yamamuka M, Yuuki A, Ono K (1996) Jpn J Appl Phys 35:4880
6. Cole MW, Joshi PC, Ervin MH (2001) J Appl Phys 89:6336
7. Yoon KH, Lee JC, Park J, Kang DH, Song CM, Seo YG (2001) Jpn J Appl Phys 40:5497
8. Madeswaran S, Giridharan NV, Jayavle R, Subramania C (2002) J Cryst Growth 237-239:858
9. Wangyang F, Lingzhu C, Shufang W, Zhihui S (2006) Appl Phys Lett 89:132908
10. KimKT, Kim CI (2005) Thin Solid Films 472:26
11. Chen SY, Wang HW, Huang LC (2001) Jpn J Appl Phys 40:4974
12. Krupanidi SB, Peng CJ (1997) Thin Solid Films 305:144
13. Cole MW, Hubbard C, Ngo E, Ervin M, Wood M (2002) J Appl Phys 92:475
14. Diamaond H (1961) J Appl Phys 32:909
15. Wang S-x, Hao J-h, Wu Z-p, Wang D-Y, Zhuo Y et al (2007) Appl Phys Lett 91:252908