Effect of the microwave oven on structural, morphological and electrical properties of SrBi4Ti4O15 thin films grown on Pt/Ti/SiO2/Si substrates by a soft chemical method

Materials Characterization

Volumn 59, Issue 6, 2008, Pages 675-680

  Simoes A Z ^a   Ramirez, M A ^a   Riccardi, C S ^a   Longo, E ^a   Varela, J A ^a  

^a SÃO PAULO STATE UNIVERSITY UNESP   (Brazil)

Author keywords

Atomic force microscopy; Dielectric properties; Fatigue; Thin films

Indexed keywords

ATOMIC FORCE MICROSCOPY; DIELECTRIC PROPERTIES; HEAT TREATMENT; MICROWAVE OVENS; STRONTIUM COMPOUNDS; X RAY DIFFRACTION ANALYSIS;

PLATINUM COATED SILICON SUBSTRATES; SOFT CHEMICAL METHOD;

THIN FILMS;

EID: 41349108871     PISSN: 10445803     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matchar.2007.05.022     Document Type: Article

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