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Volumn 14, Issue 4-5, 2008, Pages 601-606

Germanium resistors for RF MEMS based microsystems

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROMAGNETISM; GERMANIUM COMPOUNDS; MEMS; MICROSYSTEMS;

EID: 41149155957     PISSN: 09467076     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00542-007-0448-4     Document Type: Conference Paper
Times cited : (3)

References (16)
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  • 3
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    • Polycrystalline silicon-germanium films for integrated microsystems
    • Franke A, Heck J, King T, Howe R (2003) Polycrystalline silicon-germanium films for integrated microsystems. J MEMS 12:160-171
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    • MEMS based thin film 2 GHz resonator for CMOS integration
    • Philadelphia, USA, June 8-13
    • Hara M, Kuypers J, Abe T, Esahi M (2003) MEMS based thin film 2 GHz resonator for CMOS integration. IEEE MTT-S Int, Philadelphia, USA, June 8-13, 3:1797-1800
    • (2003) IEEE MTT-S Int , vol.3 , pp. 1797-1800
    • Hara, M.1    Kuypers, J.2    Abe, T.3    Esahi, M.4
  • 7
    • 0037251073 scopus 로고    scopus 로고
    • Very low-loss distributed X-band and Ka-band MEMS phase shifters using metal-air-metal capacitors
    • Hayden J, Rebeiz G (2003) Very low-loss distributed X-band and Ka-band MEMS phase shifters using metal-air-metal capacitors. IEEE MTT 51:309-314
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    • Hayden, J.1    Rebeiz, G.2
  • 9
    • 31044442508 scopus 로고    scopus 로고
    • Design and modeling of 4-bit slow-wave MEMS phase shifters
    • Lakshminarayanan B, Weller T (2006) Design and modeling of 4-bit slow-wave MEMS phase shifters. IEEE MTT 54:120-127
    • (2006) IEEE MTT , vol.54 , pp. 120-127
    • Lakshminarayanan, B.1    Weller, T.2
  • 10
    • 36249021917 scopus 로고    scopus 로고
    • A novel sacrificial layer technology based on highly selective etching of silicon-germanium in CLF3
    • Kobe, Japan, January 21-25
    • Leinenbach C, Seidel H, Fuchs T, Kronmueller S, Laermer F (2007) A novel sacrificial layer technology based on highly selective etching of silicon-germanium in CLF3. IEEE MEMS 2007 conference, Kobe, Japan, January 21-25, 65-68
    • (2007) IEEE MEMS 2007 Conference , pp. 65-68
    • Leinenbach, C.1    Seidel, H.2    Fuchs, T.3    Kronmueller, S.4    Laermer, F.5
  • 11
    • 0033326774 scopus 로고    scopus 로고
    • Germanium as a versatile material for low-temperature micromachining
    • Li B, Xiong B, Jiang L, Zohar Y, Wong M (1999) Germanium as a versatile material for low-temperature micromachining. J MEMS 8:366-372
    • (1999) J MEMS , vol.8 , pp. 366-372
    • Li, B.1    Xiong, B.2    Jiang, L.3    Zohar, Y.4    Wong, M.5
  • 14
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    • Si and SiGe millimeter-wave integrated circuits
    • Russer P (1998) Si and SiGe millimeter-wave integrated circuits. IEEE MTT 46:590-603
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  • 15
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    • Germanium-diffused wavguide in silicon for λ = 1.3 μm and λ = 1.55 μm with losses below 0.5 dB/cm
    • Schmidtchen J, Schüppert B, Splett A, Petermann K (1992) Germanium-diffused wavguide in silicon for λ = 1.3 μm and λ = 1.55 μm with losses below 0.5 dB/cm. IEEE Photonics Technol Lett 4:1843-1852
    • (1992) IEEE Photonics Technol Lett , vol.4 , pp. 1843-1852
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.