Smoothing and passivation of special Si(111) substrates: Studied by SPV, PL, AFM and SEM measurements

Analytical and Bioanalytical Chemistry

Volumn 390, Issue 6, 2008, Pages 1463-1470

  Angermann, H ^a   Rappich, J ^a   Sieber, I ^a   Hubener K ^b   Hauschild, J ^b  

^a HAHN MEITNER INSTITUT   (Germany)

^b FREIE UNIVERSITÄT BERLIN   (Germany)

Author keywords

Atomic force microscopy; Electron microscopy; Interface state density; Photoluminescence; Surface photovoltage; Wet chemical surface pretreatment

Indexed keywords

ATOMIC FORCE MICROSCOPY; PASSIVATION; PHOTOLUMINESCENCE; PHOTOVOLTAIC EFFECTS; SCANNING ELECTRON MICROSCOPY;

INTERFACE STATE DENSITY; WET CHEMICAL SURFACE PRETREATMENT;

SILICON COMPOUNDS;

SILICON;

ARTICLE; ATOMIC FORCE MICROSCOPY; CHEMISTRY; LUMINESCENCE; METHODOLOGY; PHOTOCHEMISTRY; SCANNING ELECTRON MICROSCOPY;

LUMINESCENT MEASUREMENTS; MICROSCOPY, ATOMIC FORCE; MICROSCOPY, ELECTRON, SCANNING; PHOTOCHEMISTRY; SILICON;

SWINEPOX VIRUS (STRAIN KASZA);

EID: 41149088958     PISSN: 16182642     EISSN: 16182650     Source Type: Journal    
DOI: 10.1007/s00216-007-1738-5     Document Type: Article

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