Chemical treatment effects of silicon surfaces in aqueous KF solution

Applied Surface Science

Volumn 246, Issue 1-3, 2005, Pages 139-148

  Noguchi, Hiroshi ^a   Adachi, Sadao ^a  

^a GUNMA UNIVERSITY   (Japan)

Author keywords

Chemical treatment; Native oxide; Si; Spectroscopic ellipsometry

Indexed keywords

ATOMIC FORCE MICROSCOPY; ELLIPSOMETRY; ETCHING; POTASSIUM COMPOUNDS; REMOVAL; SILICON; SOLUTIONS; SURFACE ROUGHNESS; SURFACE TREATMENT; SURFACES; X RAY PHOTOELECTRON SPECTROSCOPY;

CHEMICAL TREATMENT; DEGREASING; NATIVE OXIDE; SPECTROSCOPIC ELLIPSOMETRY;

SURFACE CHEMISTRY;

EID: 17744387131     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2004.11.003     Document Type: Article

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