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Volumn 143, Issue 1, 2008, Pages 1-6

Miniaturized thermal flow sensor with planar-integrated sensor structures on semicircular surface channels

Author keywords

Microfluidics; Micromachined calorimetric flow sensor

Indexed keywords

CALORIMETRY; FLOW OF WATER; FLOW RATE; MATHEMATICAL MODELS; MICROCHANNELS; MICROFLUIDICS; SILICON NITRIDE;

EID: 40949095342     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.sna.2007.12.005     Document Type: Article
Times cited : (81)

References (10)
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    • Wu S., Lin Q., Yuen Y., and Tai Y.-C. MEMS flow sensors for nano-fluidic applications. Sens. Actuator A 89 (2001) 152-158
    • (2001) Sens. Actuator A , vol.89 , pp. 152-158
    • Wu, S.1    Lin, Q.2    Yuen, Y.3    Tai, Y.-C.4
  • 2
    • 3042739516 scopus 로고    scopus 로고
    • Nanofluidic flowmeter using carbon sensing element
    • Mizuno Y., Liger M., and Tai Y.-C. Nanofluidic flowmeter using carbon sensing element. Proc. IEEE MEMS (2004) 322-325
    • (2004) Proc. IEEE MEMS , pp. 322-325
    • Mizuno, Y.1    Liger, M.2    Tai, Y.-C.3
  • 7
    • 26944432704 scopus 로고    scopus 로고
    • A fully-dry PECVD-oxynitride process for microGC column fabrication
    • Agah M., and Wise K.D. A fully-dry PECVD-oxynitride process for microGC column fabrication. Proc. IEEE MEMS (2005) 774-777
    • (2005) Proc. IEEE MEMS , pp. 774-777
    • Agah, M.1    Wise, K.D.2
  • 9
    • 0021374997 scopus 로고
    • Inhibition of acid etching of Pt by pre-exposure to oxygen plasma
    • Kim M.J., Gruenke L.A., Saia R.J., and Cohen S.S. Inhibition of acid etching of Pt by pre-exposure to oxygen plasma. Appl. Phys. Lett. 44 (1984) 462-464
    • (1984) Appl. Phys. Lett. , vol.44 , pp. 462-464
    • Kim, M.J.1    Gruenke, L.A.2    Saia, R.J.3    Cohen, S.S.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.