Nanoscale investigation of long-term native oxidation of Cu films

Thin Solid Films

Volumn 516, Issue 12, 2008, Pages 4040-4046

  Lim, Jae Won ^a   Iijima, Jun ^b   Zhu, Yongfu ^c   Yoo, Jung Ho ^d   Choi, Good Sun ^a   Mimura, Kouji ^b   Isshiki, Minoru ^b  

^a Korea Institute of Geosceince and Mineral Resources   (South Korea)

^b TOHOKU UNIVERSITY   (Japan)

^c Jilin University   (China)

^d National Nano Fab Center (NNFC)   (South Korea)

Author keywords

Copper; Cu2O; CuO; Oxidation; Purity; Substrate bias voltage; Thin film

Indexed keywords

BIAS VOLTAGE; COPPER; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; NUCLEATION; OXIDATION; SPECTROSCOPIC ELLIPSOMETRY; X RAY PHOTOELECTRON SPECTROSCOPY;

OXIDE LAYERS; PURITY; SUBSTRATE BIAS VOLTAGE;

METALLIC FILMS;

EID: 40849145817     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.12.159     Document Type: Article

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