Influence of substrate bias voltage on the properties of Cu thin films by sputter type ion beam deposition

Materials Transactions

Volumn 43, Issue 6, 2002, Pages 1403-1408

  Lim, Jae Won ^a   Ishikawa, Yukio ^a   Miyake, Kiyoshi ^a   Yamashita, Mutsuo ^a   Isshiki, Minoru ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

Copper; Ion beam deposition; Resistivity

Indexed keywords

COPPER; ELECTRIC CONDUCTIVITY; ELECTRIC POTENTIAL; GRAIN BOUNDARIES; ION BEAM ASSISTED DEPOSITION; MORPHOLOGY; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING SILICON; SPUTTER DEPOSITION; X RAY DIFFRACTION ANALYSIS;

BIAS VOLTAGE;

THIN FILMS;

EID: 0036600125     PISSN: 13459678     EISSN: None     Source Type: Journal    
DOI: 10.2320/matertrans.43.1403     Document Type: Article

References (16)