New pH-sensitive TaOxNy membranes prepared by NH3 plasma surface treatment and nitrogen incorporated reactive sputtering

Sensors and Actuators, B: Chemical

Volumn 130, Issue 1, 2008, Pages 77-81

  Lai, Chao Sung ^a   Lue, Cheng En ^a   Yang, Chia Ming ^a   Jao, Jui Hsiu ^a   Tai, Chih Chiang ^a  

^a CHANG GUNG UNIVERSITY   (Taiwan)

Author keywords

Drift; Nitrogen incorporation; RF sputtering; Ta2O5; TaOxNy

Indexed keywords

NITROGEN; REACTION KINETICS; REACTIVE SPUTTERING;

DRIFT COEFFICIENT; NITROGEN INCORPORATION;

TANTALUM COMPOUNDS;

EID: 40749146030     PISSN: 09254005     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.snb.2007.07.115     Document Type: Article

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