Process investigation of a-Si:H thin films prepared by DC magnetron sputtering

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6825, Issue , 2008, Pages

  Liu, Chunling ^a,b   Wang, Chunwu ^b   Yao, Yanping ^a,b   Zhang, Jing ^a   Qiao, Zhongliang ^a   Huang, Bo ^a   Wang, Yuxia ^a   Bo, Baoxue ^a  

^a CHANGCHUN UNIVERSITY OF SCIENCE AND TECHNOLOGY   (China)

^b JILIN NORMAL UNIVERSITY   (China)

Author keywords

a Si:H; Extinction coefficient; Refractive index; Spectroscopic ellipsometer

Indexed keywords

AMORPHOUS SILICON; FOURIER TRANSFORM INFRARED SPECTROSCOPY; LIGHT EXTINCTION; MAGNETRON SPUTTERING; REFRACTIVE INDEX; SPECTROSCOPIC ELLIPSOMETRY;

EXTINCTION COEFFICIENT;

THIN FILMS;

EID: 40749141607     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.754917     Document Type: Conference Paper

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