Molecular arrangement and photopatterning of copolymer containing ketal-protected group in ultrathin nanosheets

Surface Science

Volumn 602, Issue 6, 2008, Pages 1141-1148

  Xu, Wenjian ^a,b,c   Li, Tiesheng ^a,b,c   Zeng, Gouliang ^a,b,c   Ren, Fangfang ^a   Zhang, Suhua ^a   Wu, Yangjie ^a,b,c   Miyashita, Tokuji ^d  

^a ZHENGZHOU UNIVERSITY   (China)

^b The Key Lab of Chemical Biology and Organic Chemistry of Henan Province   (China)

^c The Key Lab of Advanced Nano information Materials of Zhengzhou   (China)

^d TOHOKU UNIVERSITY   (Japan)

Author keywords

Copolymer; Etching; Ketal group; Langmuir Blodgett films; Monolayer; Photopatterning

Indexed keywords

COPOLYMERS; LANGMUIR BLODGETT FILMS; MOLECULAR ORIENTATION; NANOSHEETS; SOLUTIONS;

LANGMUIR MONOLAYERS; MOLECULAR ARRANGEMENT; PHOTOPATTERNING; SURFACE PRESSURE;

ULTRATHIN FILMS;

EID: 40649121250     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.susc.2007.12.045     Document Type: Article

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