Preparation of Poly(N-alkylmethacrylamide) Langmuir-Blodgett Films for the Application to a Novel Dry-Developed Positive Deep UV Resist

Macromolecules

Volumn 32, Issue 4, 1999, Pages 1115-1118

  Guo, Yinzhong ^a   Feng, Fei ^a   Miyashita, Tokuji ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EXCIMER LASERS; GLASS; LANGMUIR BLODGETT FILMS; MONOLAYERS; PHOTOLYSIS; PHOTORESISTS; POLYAMIDES; QUARTZ; ULTRAVIOLET RADIATION;

POLYALKYLMETHACRYLAMIDE;

PLASTIC FILMS;

EID: 0033076408     PISSN: 00249297     EISSN: None     Source Type: Journal    
DOI: 10.1021/ma9817830     Document Type: Article

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