Photolithographic properties of ultrathin polymer Langmuir-Blodgett films containing anthracene moieties

Journal of Materials Chemistry

Volumn 13, Issue 7, 2003, Pages 1565-1569

  Li, Tiesheng ^a   Chen, Jinfeng ^a   Mitsuishi, Masaya ^a   Miyashita, Tokuji ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

COPOLYMERS; DECOMPOSITION; DIMERIZATION; ETCHING; IRRADIATION; POLYMETHYL METHACRYLATES; SILICON WAFERS; ULTRATHIN FILMS;

PHOTODIMERIZATION;

LANGMUIR BLODGETT FILMS;

ANTHRACENE DERIVATIVE; COPPER; GOLD; POLY(METHYL METHACRYLATE); POLY(N NEOPENTYL METHACRYLAMIDE CO 9 ANTHRYLMETHYL METHACRYLATE); SILICON; UNCLASSIFIED DRUG; WATER;

ANALYTIC METHOD; ARTICLE; DECOMPOSITION; DIMERIZATION; FILM; LANGMUIR BLODGETT FILM; MOLECULAR STABILITY; MONOLAYER CULTURE; NANOTECHNOLOGY; PHOTODEGRADATION; PHOTODIMERIZATION; PHOTOGRAPHY; PHOTOLITHOGRAPHY; POLYMERIZATION; SPECTRAL SENSITIVITY; SURFACE PROPERTY; WATER ANALYSIS;

EID: 0038641283     PISSN: 09599428     EISSN: None     Source Type: Journal    
DOI: 10.1039/b300686g     Document Type: Article

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