Poly(N-alkylmethacrylamide) LB films with short-branched alkyl side chains for a self-developed positive photoresist

Macromolecules

Volumn 34, Issue 11, 2001, Pages 3548-3551

  Guo, Yinzhong ^a   Mitsuishi, Masaya ^a   Miyashita, Tokuji ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

GLASS SUBSTRATES;

ETCHING; IRRADIATION; LIGHT ABSORPTION; PHOTORESISTS; POLYAMIDES; SPECTRUM ANALYSIS; SUBSTRATES; ULTRATHIN FILMS; ULTRAVIOLET RADIATION; X RAY DIFFRACTION ANALYSIS;

LANGMUIR BLODGETT FILMS;

EID: 0035933250     PISSN: 00249297     EISSN: None     Source Type: Journal    
DOI: 10.1021/ma0008591     Document Type: Article

References (17)