Stochastic Coulomb blockade in coupled asymmetric silicon dots formed by pattern-dependent oxidation

Applied Physics Letters

Volumn 92, Issue 9, 2008, Pages

  Manoharan, M ^a   Tsuchiya, Yoshishige ^a   Oda, Shunri ^a   Mizuta, Hiroshi ^a,b  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

^b UNIVERSITY OF SOUTHAMPTON   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

OXIDATION; RANDOM PROCESSES; THERMAL EFFECTS;

INDIVIDUAL DOTS; STOCHASTIC COULOMB BLOCKADE;

COULOMB BLOCKADE;

EID: 40549124333     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2891063     Document Type: Article

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