Interfacial reactions and electrical properties of Ti/n-GaN contacts

MRS Internet Journal of Nitride Semiconductor Research

Volumn 2, Issue , 1997, Pages

  Cordes, Holger ^a   Chang, Y A ^a  

^a University of Wisconsin Madison   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CURRENT VOLTAGE CHARACTERISTICS; DIFFUSION; ELECTRIC LINES; ELECTRIC RESISTANCE; PHASE EQUILIBRIA; RAPID THERMAL ANNEALING; SURFACE REACTIONS; THERMODYNAMIC STABILITY; TITANIUM; X RAY DIFFRACTION ANALYSIS;

CONTACT RESISTANCE; CONTACT TECHNOLOGY; DIFFUSION COUPLES;

GALLIUM NITRIDE;

EID: 4043094835     PISSN: 10925783     EISSN: None     Source Type: Journal    
DOI: 10.1557/s1092578300001289     Document Type: Article

References (27)

1. S. C. Binari, H. B. Dietrich, G. Kelner, L. B. Rowland, K. Doverspike, D. K. Gaskill, Electron. Lett. 30, 909-911 (1994).
2. M. E. Lin, Z. Ma, F. Y. Huang, Z. F. Fan, L. H. Allen, H. Morkoc, Appl. Phys. Lett. 64, 1003-1005 (1994).
3. J. D. Guo, C. I. Lin, M. S. Feng , F. M. Pan , G. C. Chi, C. T. Lee , Appl. Phys. Lett. 68, 235-237 (1996).
4. K.V. Vassilevski, M.G. Rastegaeva, A.I. Babanin, I.P. Nikitina, V.A. Dmitriev, MRS Internet J. Nitride Semicond. Res. 1, 38 (1996).
5. Zhifang Fan, S. Noor Mohammad, Wook Kim, Ozgur Aktas, Andrei E. Botchkarev, Hadis Morkoc, Appl. Phys. Lett. 68, 1672-1674 (1996).
6. SE Mohney, X Lin, J. Electron. Mater. 25, 811-818 (1996).
7. JL Murray, Phase Diagrams of Binary Titanium Allloys (ASM International, Metals Park, Ohio, 1987).
8. M Poetschke, K Schubert, Z. Metall. 53, 474-488 (1962).
9. W Jeitschko, H Nowotny, F Bebesowsky, Mon. Chem. 95, 178-179 (1964).
10. J Klingbeil, R Schmid-Fetzer, J. Phase Equilibria 13, 522-531 (1992).
11. FR de Boer, R Boom, WCM Mattens, AR Miedema, AK Niessen, Cohesion in Metals (North Holland, Amsterdam, 1988).
12. O Kubaschewski, CB Alcock, PJ Spencer, Materials Thermochemistry (Pergamon Press, Oxford, 1993).
13. P Villars, LD Calvert, Pearsons Handbook of Crystallographic Data for Intermettalic Phases (American Society of Metals, Metals Park,Ohio, 1985).
14. W Kraus, G Nolze, PowderCell 1.8 (1996).
15. NR Perkins, MN Horton, RJ Matyi, ZZ Bandic, TC McGill, TF Kuechin 13th Int. Conference on CVD, , (Los Angeles, 1996) x.
16. GK Reeves, Sol. St. Electr. 23, 487-490 (1980).
17. Lei Wang, M. I. Nathan, T-H. Lim , M. A. Khan, Q. Chen ,Appl. Phys. Lett. 68, 1267-1269 (1996).
18. J. S. Foresi, T. D. Moustakas, Appl. Phys. Lett. 62, 2859-2861 (1993).
19. J. I. Pankove, H. Schade, Appl. Phys. Lett. 25, 53 (1974).
20. HB Michaelson, J. Appl. Phys. 48, 4729-4732 (1977).
21. VS Fomenko, GV Samsonov, Handbook of Thermionic Properties (Plenum Press, New York, 1966).
22. SJ Pearton, RJ Shul, RG Wilson, F Ren, JM Zavada, CR Abernathy, CB Vartuli, JW Lee, JR Mileham, JD Mackenzie, J. Electron. Mater. 25, 845-849 (1996).
23. LF Lester, JM Brown, JC Ramer, L Zhang, SD Hersee, JC Zolper, Appl. Phys. Lett. 69, 2737-2739 (1996).
24. AT Ping, MA Khan, I Adesida, J. Electron. Mater. 25, 819-824 (1996).
25. S Ruvimov, Z Liliental-Weber, J Washburn, KJ Duxstad, EE Haller, Z-F Fan, SN Mohammad, W Kim, AE Botchkarev, H Morkoc, Appl. Phys. Lett. 69, 1556-1558 (1996).
26. JC Schuster, J Bauer, J. Sol. St. Chem. 53, 260-265 (1984).
27. QZ Liu, SS Lau, N Perkins, M Horton, TF Kuech, unpublished (1996).