Low-macroscopic field emission from fibrous ZnO thin film prepared by catalyst-free solution route

Applied Surface Science

Volumn 236, Issue 1-4, 2004, Pages 231-235

  Maity, R ^a   Banerjee, A N ^a   Chattopadhyay, K K ^a  

^a JADAVPUR UNIVERSITY   (India)

Author keywords

Field emission; Low threshold; Solution method; ZnO fiber structured

Indexed keywords

CARBON NANOTUBES; CATALYSTS; COATING TECHNIQUES; ELECTRIC POTENTIAL; FIELD EMISSION DISPLAYS; SCANNING ELECTRON MICROSCOPY; THIN FILMS; X RAY DIFFRACTION;

FIELD EMISSION; LOW THRESHOLD; SOLUTION METHOD; THERMAL EVAPORATION; ZNO FIBER STRUCTURED;

ZINC COMPOUNDS;

EID: 4043078372     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2004.04.037     Document Type: Article

References (26)

1. Fink R.L., Li Tolt Z., Yaniv Z. Surf. Coat. Technol. 108-109:1998;570.
2. Spindt C.A., Brodie I., Humphrey L., Westerberg E.R. J. Appl. Phys. 47:1976;5248.
3. May P.W., Hohn S., Wang W.N., Fox N.A. Appl. Phys. Lett. 72:1998;2182.
4. Robertson J. Thin Solid Films. 296:1997;61.
5. Chen C.F., Lin C.L., Wang C.M. Appl. Phys. Lett. 82:2003;2515.
6. Zhong D.Y., Zhang G.Y., Liu S., Sakurai T., Wang E.G. Appl. Phys. Lett. 80:2002;506.
7. Zhou X.T., Lai H.L., Peng H.Y., Au F.C.K., Liao L.S., Wang N., Bello I., Lee C.S., Lee S.T. Chem. Phys. Lett. 318:2000;58.
8. Wu Z.S., Deng S.Z., Xu N.S., Chen J., Zhou J., Chen J. Appl. Phys. Lett. 80:2002;3829.
9. Kong Y.C., Yu D.P., Zhang B., Fang W., Feng S.Q. Appl. Phys. Lett. 78:2001;407.
10. Huang M.H., Wu Y.Y., Feick H., Tran N., Weber E., Yang P.D. Adv. Mater. 13:2001;113.
11. Lee C.J., Lee T.J., Lyu S.C., Zhang Y., Ruh H., Lee H.J. Appl. Phys. Lett. 81:2002;3648.
12. Dong L., Jiao J., Tuggle D.W., Petty J.M., Ellif S.A., Coulter M. Appl. Phys. Lett. 82:2003;1096.
13. Zhu Y.W., Zhang H.Z., Sun X.C., Feng S.Q., Xu J., Zhao Q., Xiang B., Wang R.M., Yu D.P. Appl. Phys. Lett. 83:2003;144.
14. Bahadur L., Hamdani M., Koenig J.F., Chartier P. Solar Energy Mater. 14:1986;107.
15. Arya S.P.S., Srivastava O.N. Cryst. Res. Technol. 23:1988;669.
16. Srivastava J.K., Agarwal L., Bhattacharyya B. J. Electrochem. Soc. 11:1989;3414.
17. Pan H.C., Wessels B.W. Mater. Res. Soc. Symp. Proc. 152:1989;3414.
18. Wan Q., Yu K., Wang T.H., Lin C.L. Appl. Phys. Lett. 83:2003;2253.
19. Wang J., Gao L. J. Mater. Chem. 13:2003;2551-2554.
20. Zhang H., Ma X., Xu J., Niu J., Yang D. Nanotechnology. 14:2003;423-426.
21. Znaidi L., Soler Illia G.J.A.A., Benyahia S., Sanchez C., Kanaev A.V. Thin Solid Films. 428:1994;257.
22. Fowler R.H., Nordheim L. Proc. R. Soc. Lond. A119:1928;173.
23. Forbes R.G. Ultramicroscopy. 79:1999;11.
24. Murphy E.L., Good R.H. Jr. Phys. Rev. 102:1956;1464.
25. Forbes R.G. J. Vac. Sci. Technol. B. 17:1999;526.
26. Minami T., Miyata T., Yamamoto T. Surf. Coat. Technol. 108-109:1998;583.