Low temperature plasma etching for Si3 N4 waveguide applications

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 26, Issue 2, 2008, Pages 253-258

  Celo, D ^a   Vandusen, R ^a   Smy, T ^a   Albert, J ^a   Tarr, N G ^a   Waldron, P D ^b  

^a CARLETON UNIVERSITY   (Canada)

^b NATIONAL RESEARCH COUNCIL CANADA   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

ANISOTROPIC ETCHING; ANISOTROPY; ELECTRON CYCLOTRON RESONANCE; INTEGRATED CIRCUITS; OPTICAL WAVEGUIDES; PLASMA ETCHING;

INTEGRATED CIRCUIT TECHNOLOGY; OPTICAL RIB WAVEGUIDE DEVICES; SILICON DIOXIDE HARD MASK; WAVEGUIDE APPLICATIONS;

SILICON NITRIDE;

EID: 40249110132     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2836424     Document Type: Article

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