New operating mode based on electron/hole profile matching in nitride-based nonvolatile memories

IEEE Electron Device Letters

Volumn 28, Issue 4, 2007, Pages 276-278

  Furnemont A ^a   Rosmeulen, M ^a   Van Der Zanden, K ^a   Van Houdt, J ^a   De Meyer, K ^a   Maes, H ^a  

^a IMEC   (Belgium)

Author keywords

Endurance; Matching; Nitride; Nonvolatile mem ories (NVM); Retention

Indexed keywords

CHANNEL HOT ELECTRON INJECTION; ENDURANCE; HIGH TEMPERATURE; HOT HOLE INJECTIONS; INJECTED ELECTRONS; MATCHING; NON-VOLATILE; NON-VOLATILE MEMORIES; NONVOLATILE MEMORY CELLS; OPERATING MODES; OPERATING VOLTAGE; RETENTION; NON-VOLATILE MEMORY;

DURABILITY; ELECTRON INJECTION; FLASH MEMORY; NITRIDES;

NITRIDES; DURABILITY;

EID: 40049094138     PISSN: 07413106     EISSN: None     Source Type: Journal    
DOI: 10.1109/LED.2007.891756     Document Type: Article

References (9)

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