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Volumn , Issue , 2006, Pages 89-92

Through silicon via and 3-D wafer/chip stacking technology

Author keywords

Printed circuit board; Three dimensional integration; Through silicon via

Indexed keywords

COSTS; FABRICATION; MICROPROCESSOR CHIPS; SILICON;

EID: 39749177820     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper
Times cited : (94)

References (15)
  • 1
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    • Matsumoto, T., et al., Three-Dimensional Integration Technology Based on Wafer Bonding Technique Using Micro-Bumps, Ext. Abstr. 1995 Int. Conf. Solid State Devices Mater., pp. 1073-1074, 1995.
    • Matsumoto, T., et al., "Three-Dimensional Integration Technology Based on Wafer Bonding Technique Using Micro-Bumps," Ext. Abstr. 1995 Int. Conf. Solid State Devices Mater., pp. 1073-1074, 1995.
  • 2
    • 0031270573 scopus 로고    scopus 로고
    • Three dimensional metallization for vertically integrated circuits
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    • Ramm, P.1
  • 4
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    • 128Mbit NAND Flash Memory by Chip-on-Chip Technology with Cu Through Plug
    • Apr
    • Sasaki, K., et al., "128Mbit NAND Flash Memory by Chip-on-Chip Technology with Cu Through Plug," 2001 Int. Conf. Electron. Packaging Proc., pp. 39-43, Apr. 2001.
    • (2001) 2001 Int. Conf. Electron. Packaging Proc , pp. 39-43
    • Sasaki, K.1
  • 5
    • 10444221697 scopus 로고    scopus 로고
    • Process Integration of 3D Chip Stack with Vertical Interconnection
    • June
    • Takahashi, K., et al., "Process Integration of 3D Chip Stack with Vertical Interconnection," Proc. 54th Electron. Components and Technol. Conf., pp. 601-609, June 2004.
    • (2004) Proc. 54th Electron. Components and Technol. Conf , pp. 601-609
    • Takahashi, K.1
  • 6
    • 10444270123 scopus 로고    scopus 로고
    • High-Performance Vertical Interconnection for high-density 3D Chip Stacking Package
    • Las Vegas, pp, June
    • Umemoto, M., et al., "High-Performance Vertical Interconnection for high-density 3D Chip Stacking Package," Proc. 54th Electron. Components and Technol. Conf., Las Vegas, pp. 616-623, June 2004.
    • (2004) Proc. 54th Electron. Components and Technol. Conf , pp. 616-623
    • Umemoto, M.1
  • 7
    • 24644517630 scopus 로고    scopus 로고
    • Architectural Implications and Process Development of 3-D VLSI Z-Axis Interconnects Using Through Silicon Vias
    • Aug
    • Schaper L. W., et al., "Architectural Implications and Process Development of 3-D VLSI Z-Axis Interconnects Using Through Silicon Vias," IEEE Trans. Adv. Packaging, Vol. 28, No. 3, pp. 356-366, Aug. 2005.
    • (2005) IEEE Trans. Adv. Packaging , vol.28 , Issue.3 , pp. 356-366
    • Schaper, L.W.1
  • 8
    • 17644378782 scopus 로고    scopus 로고
    • 3D Processing Technology and Its Impact on iA32 Microprocessors
    • Black, B., et al., "3D Processing Technology and Its Impact on iA32 Microprocessors," 22nd IEEE Int. Conf. on Computer Design Proc., 2004.
    • (2004) 22nd IEEE Int. Conf. on Computer Design Proc
    • Black, B.1
  • 10
    • 39749140416 scopus 로고    scopus 로고
    • Implementing Caches in a 3D Technology for High Performance Processors
    • Puttaswamyy, K., et al., "Implementing Caches in a 3D Technology for High Performance Processors", 23rd IEEE Int. Conf. on Computer Design Proc., 2005.
    • (2005) 23rd IEEE Int. Conf. on Computer Design Proc
    • Puttaswamyy, K.1
  • 11
    • 39749167891 scopus 로고    scopus 로고
    • Sakurai, T., Issues of Current LSI Technology and an Expectation for New System-Level Integration, Ext. Abstr. of 2001 Int. Conf. on Solid State Devices and Mater., pp.36-37, 2001.
    • Sakurai, T., "Issues of Current LSI Technology and an Expectation for New System-Level Integration", Ext. Abstr. of 2001 Int. Conf. on Solid State Devices and Mater., pp.36-37, 2001.
  • 12
    • 39749130441 scopus 로고    scopus 로고
    • Trends of Semiconductor Devices and Future Prospect for "System Integration" Technology
    • in Japanese
    • Okamoto, K., "Trends of Semiconductor Devices and Future Prospect for "System Integration" Technology," IEICE Trans. Electron., Vol. J88-C, No. 11, pp. 839-850, 2005. [in Japanese]
    • (2005) IEICE Trans. Electron , vol.J88-C , Issue.11 , pp. 839-850
    • Okamoto, K.1
  • 13
    • 0042612609 scopus 로고
    • Hourglass-shaped Conductive Connection Through Semiconductor Structures
    • United States Patent 3,648,131, Mar. 7
    • Stuby, K.; Falls, W., "Hourglass-shaped Conductive Connection Through Semiconductor Structures", United States Patent 3,648,131, Mar. 7, 1972.
    • (1972)
    • Stuby, K.1    Falls, W.2
  • 14
    • 39749087000 scopus 로고    scopus 로고
    • Novel Low Cost Integration of Through Chip Interconnection and Application to CMOS Image Sensor
    • submitted to 56th Electron
    • Sekiguchi, M., et al., "Novel Low Cost Integration of Through Chip Interconnection and Application to CMOS Image Sensor," submitted to 56th Electron. Components and Technol. Conf.
    • Components and Technol. Conf
    • Sekiguchi, M.1
  • 15
    • 0000983009 scopus 로고
    • Thermal Response of Metals to Ultrashort-Pulse Laser Excitation
    • Dec
    • Corkum, P. B., et al., "Thermal Response of Metals to Ultrashort-Pulse Laser Excitation," Phys. Rev. Lett., Vol. 61, No. 25, pp. 2886-2889, Dec. 1988.
    • (1988) Phys. Rev. Lett , vol.61 , Issue.25 , pp. 2886-2889
    • Corkum, P.B.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.