Nanolithography on hydrogen-terminated silicon by scanning-probe microscopy

Microelectronic Engineering

Volumn 32, Issue 1-4 SPEC. ISS., 1996, Pages 203-217

  Schönenberger, Christian ^a,b   Kramer, Niels ^a  

^a PHILIPS RESEARCH LABORATORIES   (Netherlands)

^b UNIVERSITY OF BASEL   (Switzerland)

Author keywords

Device; Electron beam lithography; Electronic device; Etch mask; Etching; Lithography; Mask; Nanofabrication; Nanostructures; Pattern transfer; Resist; Scanning probe microscope (SPM); SFM; STM

Indexed keywords

ATOMIC FORCE MICROSCOPY; ETCHING; NANOSTRUCTURED MATERIALS; NANOTECHNOLOGY; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING SILICON;

NANOLITHOGRAPHY;

ELECTRON BEAM LITHOGRAPHY;

EID: 0030232907     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/0167-9317(95)00178-6     Document Type: Article

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